Designed for the chemical vapor deposition (CVD) and chemical vapor infiltration (CVI) of a variety of materials, including silicon carbide, pyrolytic carbon, boron nitride, zinc selenide and zinc sulfide. Gas and vapor delivery systems coordinate mass flow controls and modulating valves to deliver reactant and carrier gases like N, H, Ar, CO2, methane, silicon tetrachloride, methyl trichlorosilane, ammonia and others.

Rotalab provides various laboratory furnaces to be used in scientific research and industrial production for chemical vapor deposition and infiltration processes.

Tube Furnace with Low Vacuum and Gas Delivery System by Floatmeter
  • OTF-1200X-S50-2F

  • OTF-1200X-80-I-F3LV-UL

  • OTF-1200X-80-II-F3LV-UL

  • OTF-1200X-80-III-F3L

  • OTF-1200X-S-FB-UL

  • OTF-1200X-5-III-SF

  • OTF-1200X-R-60HG

  • GSL-1700X-F3LV Series

  • GSL-1700X-60-III-F3LV

Tube Furnace with High Vacuum and Gas Delivery System by Precision MFC
  • OTF-1200X-HVC3-UL

  • OTF-1200X-III-HVC Series-UL

  • OTF-1200X-4-III-9HV

  • GSL-1700X-4-HVC-UL

  • GSL-1700X-HV Series-UL

  • GSL-1700X-80-HVC9-UL

Tube Furnaces for Graphene and Carbon Nanotube (CNT) Growth
  • OTF-1200X-50-SL-UL

  • OTF-1200X-4-RTP-UL

  • OTF-1200X-4-NW

  • OTF-1200X-4-RTP-SL

  • OTF-1200X-80SL

  • OTF-1200X-S2-50SL

  • OTF-1200X-4-C4-SL-UL

  • GSL-1500X-OTF-50SL

  • OTF-1200X-50-DSL

  • OTF-1200X-III-D5-4

Hydrogen Gas Tube Furnaces
  • GSL-1500X-50HG

  • GSL-1700X-S60HG

  • OTF-1200X-60HG

  • OTF-1200X-60HG-SS

  • OTF-1200X-II-80HG-UL

  • OTF-1200X-R-60HG

  • GSL-1200X-H8

  • HD-11S-LD

  • KSL-1200X-H2

  • KSL-1700X-H2

  • KSL-1700X-H3

  • KSL-1700X-H4

  • QL-500