NANOIMPRINT RESISTS

Rotalab provides resist formulations for nanoimprint lithography (NIL). The unique key features of our products are outstanding film forming and imprinting performance beside excellent pattern fidelity and plasma etch stability. Our nanoimprint resists are mostly applied as etch mask for pattern transfer into various substrates, like Si, SiO2, Al or sapphire.

Basically, two different variants of NIL have been developed so far: thermal NIL (also known as thermoplastic NIL, T-NIL), in which a thermoplastic polymer is used, and photo NIL (also known as photocurable NIL, P-NIL), in which a liquid photo-curable formulation is applied.

Thermal-Nanoimprint Lithography
  • mr-I 7000R

    MICRO RESIST TECHNOLOGY
    Nanoimprint Resist
    NIL Resist
  • mr-I 8000R

    MICRO RESIST TECHNOLOGY
    Nanoimprint Resist
    NIL Resist
  • SIPOL

    MICRO RESIST TECHNOLOGY
    Nanoimprint Resist
    NIL Resist
  • mr-I T85

    MICRO RESIST TECHNOLOGY
    Nanoimprint Resist
    NIL Resist
  • mr-I 9000M

    MICRO RESIST TECHNOLOGY
    Nanoimprint Resist
    NIL Resist
  • mr-I PMMA35k

    MICRO RESIST TECHNOLOGY
    Nanoimprint Resist
    NIL Resist
Photo-Nanoimprint Lithography
  • mr-NIL210

    MICRO RESIST TECHNOLOGY
    Nanoimprint Resist
    NIL Resist
  • mr-UVCur21

    MICRO RESIST TECHNOLOGY
    Nanoimprint Resist
    NIL Resist
  • mr-XNIL26

    MICRO RESIST TECHNOLOGY
    Nanoimprint Resist
    NIL Resist
  • mr-UVCur26SF

    MICRO RESIST TECHNOLOGY
    Nanoimprint Resist
    NIL Resist
Combined Thermal- and Photo-Nanoimprint Lithography
  • mr-NIL 6000E

    MICRO RESIST TECHNOLOGY
    Nanoimprint Resist
    NIL Resist
Working Stamp Fabrication
  • OrmoStamp

    MICRO RESIST TECHNOLOGY
    Nanoimprint Resist
    NIL Resist
  • UV-PDMS

    SHIN-ETSU
    Nanoimprint Resist
    NIL Resist
Ancillaries
  • Ancillaries
    for Nanoimprint Resists

    MICRO RESIST TECHNOLOGY
    Thinner, Adhesion Promoter, and Organic Underlayer Materials
    Nanoimprint Resist Ancillaries